Verteq Spin Rinse Dryer Manual

Verteq scp power control module for a spin rinse dryer scd800 c1 e2.

Verteq spin rinse dryer manual.

Spin rinse dryers rena na compass spin rinse dryers are top quality wafer dryers that rinse off any particles left over from a previous process step such as etching and then dry the wafer. Verteq 1081190 1 verteq rotor spin rinser dryer. Verteq superclean spin rinse dryer spin rinse dryer. Spin rinse dryer srd verteq model 1600 34 44 55.

This tool is simple to operate but there are some subtle aspects that this paper will add to the operation procedure. We own two verteq rinse dryers to avoid contaminations one rinse dryer is dedicated to solvents and the other one to acids. 15 2213 all items are sold as is without warranty unless specifically stated in the posting. The rinser dryer is able to load a cassette of 25 6 wafers.

Verteq scp power control module for a spin rinse dryer scd800 c1 e2. In addition to this verteq 1600 55 a capovani brothers inc. The utd clean room has purchased a new avenger spin rinse dryer from microprocess technologies. The compass srd family is designed to reduce operating costs while meeting and exceeding cleanliness dryness and particle specifications.

This tool offers over 95 uptime a small footprint and low cost of ownership. You are buying a verteq st600 c2 e1 spin rinse dryer motor controller used. The acquisition agreement states that sitek will oversee marteq s full business activities related to the verteq spin rinser dryer products. This does not mean that the unit doesn t work.

Each available in various configurations. Stocks a wide range of used spin rinse dryers. Benchtop single stack and double stack. Verteq 1081213 1 verteq rotor spin rinser dryer.

To view our complete stock of used spin rinse dryers visit our spin rinse dryers category. Rinsing is performed rotating the cassette and spraying 18 mohm di water drying is performed by electronic grade n 2 while rotating the cassette. Verteq 8045r4 2 teach pendant handheld controller pad. To help rinse substrates without leaving water spots as is commonly seen in manual n2 gun drying.